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首页> 外文会议>Conference on X-Ray Nanoimaging: Instruments and Methods >Focus of a Multilayer-Laue-Lens with an Aperture of 102 microns Determined by Ptychography at Beamline 1-BM at the Advanced Photon Source
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Focus of a Multilayer-Laue-Lens with an Aperture of 102 microns Determined by Ptychography at Beamline 1-BM at the Advanced Photon Source

机译：在高级光子源处，通过束流线描记法在光束线1-BM上确定的孔径为102微米的多层Laue透镜的焦点

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Ptychography was used to determine the focus of a Multilayer-Laue-Lens (MLL) at beamline 1-BM at the Advanced Photon Source (APS). The MLL had a record aperture of 102 microns with 15170 layers. The measurements were made at 12 keV. The focal length was 9.6 mm, and the outer-most zone was 4 nm thick. MLLs with ever larger apertures are under continuous development since ever longer focal lengths, ever larger working distances, and ever increased flux in the focus are desired. A focus size of 25 nm was determined by ptychographic phase retrieval from a gold grating sample with 1 micron lines and spaces over 3.0 microns horizontal distance. The MLL was set to focus in the horizontal plane of the bending magnet beamline. A CCD with 13.0 micron pixel size positioned 1.13 m downstream of the sample was used to collect the transmitted intensity distribution. The beam incident on the MLL covered the whole 102 micron aperture in the horizontal focusing direction and 20 microns in the vertical direction. 160 iterations of the difference map algorithm were sufficient to obtain a reconstructed image of the sample. The present work highlights the utility of a bending magnet source at the APS for performing coherence-based experiments. Use of ptychography at 1-BM on MLL optics opens the way to study diffraction-limited imaging of other hard x-ray optics.
机译：气相色谱用于确定高级光子源（APS）上光束线1-BM处的多层Laue-Lens（MLL）的焦点。 MLL的记录孔径为102微米，层数为15170。在12 keV下进行测量。焦距为9.6 mm，最外面的区域为4 nm厚。具有越来越大的光圈的MLL正在不断发展，因为需要越来越长的焦距，越来越大的工作距离以及越来越多的聚焦通量。通过柱状图相位检索，从具有1微米线和超过3.0微米水平距离的空间的金光栅样品中进行气相色谱相检索，确定了25 nm的焦点大小。 MLL设置为聚焦在弯曲磁体束线的水平面上。使用位于样品下游1.13 m处的13.0微米像素大小的CCD收集透射强度分布。入射到MLL上的光束在水平聚焦方向上覆盖了整个102微米的孔径，在垂直方向上覆盖了20微米。差异图算法的160次迭代足以获得样本的重建图像。本工作重点介绍了在APS上使用弯曲磁铁源进行基于相干性的实验的实用性。在MLL光学器件上以1-BM进行分型记录技术为研究其他硬X射线光学器件的衍射极限成像开辟了道路。

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