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CK-MASK semi-manual tool for mask inspection and blowing

机译：CK-MASK半手动面罩检查和吹塑工具

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Photolithography masks require a periodical inspection and cleaning. The visual inspection is often paired with a mask air blowing to remove eye visible particles. If these steps are run manually they are really critical for mask integrity in terms of contaminations, scratches, fingerprints, pellicle damage ... All these potential issues arise during the mask certification process causing mask repelliculization, and, in the worst case, mask scrap with drawbacks linked to production aspects: quality (repetitive defects), cost (mask repels/remake), production lots on hold, non-linear production WIP and non-respect of production commitments. AG8-AGM photolithography engineering team in collaboration with "Gusmini attrezzature industriali" developed a tool called "CK-MASK" able to handle 6" masks and to reduce the risks connected to masks inspection and blowing.
机译：光刻掩模需要定期检查和清洁。目视检查通常与吹入口罩的口罩配合使用，以去除眼睛可见的颗粒。如果手动执行这些步骤，则对于污染，刮擦，指纹，防护膜损坏而言，对于掩模完整性至关重要，这是所有潜在问题。在掩模认证过程中会出现所有这些潜在问题，从而导致掩模再造，在最坏的情况下，还会报废掩模与生产相关的缺点：质量（重复缺陷），成本（掩膜排斥/翻新），生产批次被搁置，非线性生产在制品和不遵守生产承诺。 AG8-AGM光刻技术工程团队与“ Gusmini attrezzature industriali”合作开发了一种名为“ CK-MASK”的工具，该工具能够处理6个掩模，并减少与掩模检查和吹塑有关的风险。

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