g ≥4.8 eV'/> Photo-assisted Processing of Amorphous Gallium Oxide (a-GaOx) Thin Film for Flexible and Transparent Device Application
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Photo-assisted Processing of Amorphous Gallium Oxide (a-GaOx) Thin Film for Flexible and Transparent Device Application

机译:用于柔性和透明器件应用的非晶氧化镓(a-GaOx)薄膜的光辅助处理

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摘要

We report the photo-assisted processing of solution-processed ultra wide bandgap oxide (Eg ≥4.8 eV), amorphous gallium oxide (a-GaOx), to enhance its conductivity. The 12-nm-thick a-GaOx), film was subjected to UV treatment at 115°C for 60 min. The results show that UV treatment induced a minimal change in the electrical properties unlike what is observed in other wide band gap (Eg ~ 3 eV) oxide materials, such as a-InZnO and a-InGaZnO.
机译:我们报告了溶液处理的超宽带隙氧化物(E g ≥4.8eV),无定形氧化镓(a-GaO x ),以增强其导电性。 12纳米厚的a-GaO x ),将薄膜在115°C进行60分钟的UV处理。结果表明,与其他宽带隙(E g 〜3 eV)氧化物材料,例如a-InZnO和a-InGaZnO。

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