• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文会议>Frequency Control Symposium, 1992. 46th., Proceedings of the 1992 IEEE >New processing techniques: sweeping of quartz wafers and a practical method for processing quartz resonators under controlled conditions
【24h】

New processing techniques: sweeping of quartz wafers and a practical method for processing quartz resonators under controlled conditions

机译：新的处理技术：石英晶片的清扫和在受控条件下处理石英谐振器的实用方法

获取原文
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Electrodiffusion of 'sweeping' has been used to remove impurities from quartz material. Traditionally, quartz is swept in the bar form prior to being cut into wafers. It is argued that it would be advantageous to place the sweeping operation later into the process, i.e., experience as much of the blank processing yield loss as possible with unswept quartz, and only sweep those that have successfully completed the blank processes. A system has been developed to greatly improve the conditions under which resonators are processed, without totally retooling the manufacturing line. The system utilizes a transportable chamber within which partially completed resonator assemblies are kept. The chamber allows access to the crystals in a clean, dry, gas environment. The temperature of the chamber can be raised to more than 300 degrees C to facilitate the elevated temperature steps in the process, i.e., conductive cement curing, preplating bake, etc.
机译：“扩散”的电扩散已用于去除石英材料中的杂质。传统上，在将石英切成薄片之前先将其扫成棒状。有人认为将清扫操作放在稍后的过程中将是有利的，即，使用未清扫的石英经历尽可能多的空白处理产量损失，而只清扫那些成功完成空白处理的石英。已经开发出一种系统，以在不完全重新装配生产线的情况下极大地改善谐振器的加工条件。该系统利用可运输的腔室，将部分完成的谐振器组件保持在该腔室中。该腔室允许在清洁，干燥，气体环境中接触晶体。腔室的温度可以升高到300摄氏度以上，以促进过程中的高温步骤，即导电胶固化，预镀烘烤等。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号