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SiC vs.Si: Two-Dimensional of Quasi-Saturation Behavior of D.MOS Devices Opcrat ng at Elevated Temperatures

机译:SiC与Si:高温下D.MOS器件的准饱和行为二维

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This paper reports a 2D analysis of the quasi-saturation behaviorof 6H-SiC DMOS devices considering surface trapping effect. Based on the study, in the pre-quasi-saturation region, the drain current is predominantly determined by the surface trapping effect. In the quasi-saturation region, the drain current is mainly influenced by the electron mobility in the substrate region.
机译:本文报告了6H-SiC DMOS器件考虑表面俘获效应的准饱和行为的二维分析。根据这项研究,在准准饱和区域,漏极电流主要由表面俘获效应决定。在准饱和区域中,漏极电流主要受衬底区域中电子迁移率的影响。

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