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首页> 外文会议>Optical System Contamination V, and Stray Light and System Optimization >Temperature effects on reflectance and emittance measurements of Martin Black and Enhanced Martin Black surfaces
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Temperature effects on reflectance and emittance measurements of Martin Black and Enhanced Martin Black surfaces

机译：温度对马丁黑和增强马丁黑表面反射率和发射率测量的影响

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Abstract: Martin Black and enhanced Martin Black samples were heated above 620 K and also cooled to 77 K while the directional reflectance and emittance were measured in the spectral region of 1.35 to 26 micrometer. Little emittance variation was found for both surfaces below 300 K. From 77 K to 315 K Martin Black emittance was 98.5% or greater from 7.5 to 24 micrometer. Similarly, enhanced Martin Black emittance was 96% or greater. Furthermore, these conditions apply up to 620 K. Significant reflectance variations below 7.5 micrometer were observed at ambient temperature after baking samples at 620 K both in air and vacuum environments. Reflectance variations as a function of temperature from 300 to 620 K were measured. Humidity and vacuum exposure effects on the surface reflectance properties were also investigated. Post-backed sample reflectance near 5 micrometer was extremely sensitive to ambient air exposure. !8
机译：摘要：将马丁·布莱克（Martin Black）和增强型马丁·布莱克（Martin Black）样品加热到620 K以上，并冷却至77 K，同时在1.35至26微米的光谱范围内测量方向反射率和发射率。对于300 K以下的两个表面，几乎没有发现发射率变化。从77 K到315 K，从7.5到24微米，马丁·布莱克发射率达98.5％或更高。类似地，增强的马丁·布莱克发射率等于或大于96％。此外，这些条件适用于620K。在空气和真空环境下以620 K烘烤样品后，在环境温度下观察到低于7.5微米的明显反射率变化。测量了反射率随温度从300到620 K的变化。还研究了湿度和真空暴露对表面反射性能的影响。支持后的样品反射率接近5微米，对环境空气暴露极为敏感。 ！8

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