【24h】

Annealing amorphous GaN - a way to nano-crystalline state

机译:退火非晶GaN-一种进入纳米晶态的方法

获取原文

摘要

The effects of thermal annealing on structural and optical properties of amorphous GaN thin films obtained by Ion Assisted Deposition (IAD) have been investigated. Thermal annealing. was carried out in flowing nitrogen and respectively under water vapour pressure (1.7-2.4 torr), at temperatures up to 800/spl deg/C. From SEM observations of the annealing processes in real time it appears that formation of nano-crystallites in the amorphous environment occurs at about 400/spl deg/C. XRD and Raman scattering performed on the annealed films prove the presence of nano-crystallites (2-4 nm). Optical measurements show a weak absorption edge in the as prepared film, and the deepening edge and reduced sub-band absorption after annealing.
机译:研究了热退火对通过离子辅助沉积(IAD)获得的非晶GaN薄膜的结构和光学性能的影响。热退火。在流动的氮气中和分别在高达800 / spl℃/℃的水蒸气压力(1.7-2.4托)下进行。从SEM对退火过程的实时观察,似乎在无定形环境中以约400 / spl℃/℃形成纳米微晶。在退火膜上进行的XRD和拉曼散射证明存在纳米微晶(2-4 nm)。光学测量表明,所制得的薄膜吸收边缘较弱,退火后边缘加深且子带吸收降低。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号