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Concave diffraction gratings fabricated with planar lithography

机译：用平面光刻制造的凹面衍射光栅

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This paper reports on the development and validation of a new technology for the fabrication of variable line-spacing non-planar diffraction gratings to be used in compact spectrometers. The technique is based on the standard lithographic process commonly used for pattern transfer onto a flat substrate. The essence of the technology presented here is the lithographic fabrication of a planar grating structure on top of a flexible membrane on a glass or silicon wafer and the subsequent deformation of the membrane using a master shape. For the validation of the proposed technology we fabricated several reflection concave diffraction gratings with the f-numbers varying from 2 to 3.8 and a diameter in the 4-7 mm range. A glass wafer with circular holes was laminated by dry-film resist to form the membranes. Subsequently, standard planar lithography was applied to the top part of the membranes for realizing grating structures. Finally the membranes were deformed using plano-convex lenses in such a way that precise lens alignment is not required. A permanent non-planar structure remains after curing. The imaging properties of the fabricated gratings were tested in a three-component spectrograph setup in which the cleaved tip of an optical fiber served as an input slit and a CCD camera was used as a detector. This simple spectrograph demonstrated subnanometer spectral resolution in the 580 - 720 nm range.
机译：本文报道了用于紧凑光谱仪的可变行距非平面衍射光栅制造新技术的开发和验证。该技术基于通常用于将图案转印到平坦基板上的标准光刻工艺。此处介绍的技术的本质是在玻璃或硅片上的柔性膜上方进行平板光栅结构的光刻制造，以及随后使用母版形状对膜进行变形。为了验证所提出的技术，我们制造了一些反射凹面衍射光栅，其f值在2到3.8之间变化，直径在4-7 mm范围内。通过干膜抗蚀剂层压具有圆孔的玻璃晶片以形成膜。随后，将标准平面光刻技术应用于膜的顶部，以实现光栅结构。最后，使用平凸透镜使膜变形，从而不需要精确的透镜对准。固化后会保留永久的非平面结构。在三组分光谱仪中测试了所制造的光栅的成像特性，其中光纤的开裂尖端用作输入缝隙，而CCD相机用作检测器。这张简单的光谱仪展示了在580-720 nm范围内的亚纳米光谱分辨率。

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