The Effect of Al-Si and Al Underlayers on Sr-ferrite Sputtered Films

机译：Al-Si和Al底层对Sr铁氧体溅射膜的影响

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Strontium ferrite (SrM) thin films have been deposited on silicon wafer with AI and Al-Si underlayer by using magnetron sputtering system. The obvious peak for strontium ferrite films with (107) orientation deposited on Al-Si and Al underlayers can be observed when substrate temperature is higher than 550 and 575 °C, respectively. The saturation magnetization, perpendicular and in-plane coercivities and perpendicular squareness ratio for both of Al-Si and Al underlayers increase with increasing substrate temperature. The maximum of coercivity and remanent squareness ratio in perpendicular direction are 6.4 kOe and 0.7, respectively, at substrate temperature of 600 °C.

机译：利用磁控溅射系统，在具有AI和Al-Si底层的硅晶片上沉积了锶铁氧体（SrM）薄膜。当衬底温度分别高于550和575°C时，可以观察到（107）取向锶铁氧体薄膜在Al-Si和Al底层上沉积的明显峰。 Al-Si和Al底层的饱和磁化强度，垂直和面内矫顽力以及垂直矩形比随衬底温度的升高而增加。在衬底温度为600°C时，垂直方向的矫顽力和剩余矩形比的最大值分别为6.4 kOe和0.7。

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《The 10th International Conference on Ferrites（2008中国国际铁氧体研讨会）论文集》|2008年|93-95|共3页
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A.Kaewrawang; A.Ghasemi; X.Liu; A.Morisako;
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SrFe12O19 ferrite; Al-Si; Al; magnetron sputtering;

机译：SR Fe12O19 ferrite;AL-SI;AL;magnetron sputtering;

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专利

1. Ferrite High Coercivity Sr-ferrite Magnetic Thin Films Induced y Various Underlayers [J] . W. C. Chang, C. T. Lin T. C. Yen Journal of Materials Science & Technology . 2000,第2期

机译：各种底层诱导的铁氧体高矫顽力锶铁氧体磁性薄膜
2. Preparation of Sr-ferrite Thin Films Prepared by Sputtering Ar and Kr Mixture Gas [J] . Keisuke Mizuno, Shigeki Nakagawa 粉体および粉末冶金 . 2003,第2期

机译：溅射Ar和Kr混合气体制备Sr铁氧体薄膜
3. Preparation of Sr-ferrite Thin Films Prepared by Sputtering Ar and Kr Mixture Gas [J] . Keisuke Mizuno, Shigeki Nakagawa 粉体および粉末冶金 . 2003,第2期

机译：通过溅射AR和KR混合气制备SR-铁氧体薄膜的制备
4. Extremely thin Sr-ferrite films with large perpendicular magnetic anisotropy prepared by facing targets sputtering with mixture gas of Ar and Kr [C] . S. Nakagawa, K. Mizuno, M. Naoe IEEE International Magnetics Conference . 2005

机译：具有大型垂直磁各向异性的极薄的SR-铁氧体薄膜通过面向AR和KR的混合气体溅射而制备
5. Influence of polymeric underlayers on physical vapor deposited titanium and titanium nitride thin films. [D] . Henry, Patrick Jonathon. 2008

机译：聚合物底层对物理气相沉积钛和氮化钛薄膜的影响。
6. High-quality thulium iron garnet films with tunable perpendicular magnetic anisotropy by off-axis sputtering – correlation between magnetic properties and film strain [O] . C. N. Wu, C. C. Tseng, Y. T. Fanchiang, -1

机译：通过离轴溅射可调节垂直磁各向异性的高质量th铁石榴石薄膜–磁性和薄膜应变之间的关系
7. Preparation of Sr-ferrite Thin Films Prepared by Sputtering Ar and Kr Mixture Gas. [O] . Keisuke Mizuno, Shigeki Nakagawa 2003

机译：通过溅射Ar和Kr混合气体制备Sr-铁氧体薄膜的制备。

The Effect of Al-Si and Al Underlayers on Sr-ferrite Sputtered Films

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