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Interfacial properties of Cu-Nb multilayers as a function of dislocation/disconnection content

机译：Cu-Nb多层膜的界面性质与位错/解离含量的函数

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Cu-Nb nanoscale metallic multilayers (NMM) exhibit very high strength when their thickness becomes less than 50nm. Incoherent or opaque interfaces play a very significant role in defining the overall behavior of the NMM structures. Due to discontinuity of slip systems, interfaces shear easily and act as barriers for slip transmission between layers; meaning that these interfaces have relatively low shear strengths and high potential in attracting glide dislocations within the layers. The interface properties evolve continuously during deformation by absorbing dislocations, leaving disconnections at the interface. These disconnections, which basically can be defined as the composition of a dislocation within the interface and a step, also act as barriers for slip transmission. The effect of such disconnections on the strengthening mechanisms of nanolayers is explored using MD simulations. The interfacial strain energy is computed for a various dislocation configurations. In particular energy maps are developed for a sheared interface as a function of dislocation content and disconnection density. Such measurements can be used in the development of a hardening law for NMM with incoherent interfaces.
机译：当其厚度小于50nm时，Cu-Nb纳米级金属多层（NMM）表现出非常高的强度。不连贯或不透明的界面在定义NMM结构的整体行为方面起着非常重要的作用。由于滑移系统的不连续性，界面容易剪切，并成为各层之间滑移传递的障碍。这意味着这些界面的剪切强度相对较低，并且在吸引层内滑移位错方面具有较高的潜力。界面特性在变形过程中会通过吸收位错而不断演化，从而在界面处留下不连贯的地方。这些断开，基本上可以定义为界面内的位错和台阶的组成，也充当滑移传递的障碍。使用MD模拟探索了这种断开对纳米层增强机制的影响。针对各种位错构造计算界面应变能。特别是，根据位错含量和断路密度，为剪切界面开发了能量图。此类测量可用于开发具有不连贯界面的NMM的硬化法则。

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