The Causation and Improvement of One Type of Particles Occurring in Batch-Clean Tool

机译：批量清洁工具中发生一种颗粒的因果和改进

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This article mainly expound the causation and improvement of one type of particles occurring in Batch-clean tool. The defect chart trend up was found since a certain time. According to many experiments, we found the particle occurring in the specific type Bath-clean tool. NH4OH in SC1 and HC1 in SC2 react to NH4Cl when the exhaust of acid and alkali is not balance for there is no shutter between SC1 and SC2 of the Bath-clean tool. The solid NH4Cl dispersed on the surface of the wafers and enlarged by next film. The defect case was improved by installing shutter between HQDR2 and SC2 to isolate the atmosphere of SC1 and SC2.

机译：本文主要阐述了批量清洁工具中发生一种类型粒子的因果和改进。从一定时间内发现了缺陷图趋势。根据许多实验，我们发现特定型浴室清洁工具中发生的颗粒。 NH. 4 哦在sc2中的sc1和hc1反应到nh 4 CL当酸和碱的排气不是平衡时，SC1和SC2之间没有快门的浴室清洁工具。固体NH. 4 CL分散在晶片表面上并由下一部薄膜放大。通过在HQDR2和SC2之间安装快门以隔离SC1和SC2的气氛来提高缺陷案例。

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《China Semiconductor Technology International Conference》|2020年|1-3|共3页
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Jing Ye; Jun Gao; Nan Lin; Jun Liu;
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Atmosphere; Tools; Solids; Market research;

机译：气氛;工具;固体;市场研究;

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The Causation and Improvement of One Type of Particles Occurring in Batch-Clean Tool

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