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Preparation and characterization of Al doped ZnO thin films by spray pyrolysis

机译：喷雾热解法制备掺铝ZnO薄膜及其表征

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ZnO and Al-doped ZnO (AZO) thin films were prepared at 350°C on glass substrates by chemical spray pyrolysis method. In this contribution, the effects of aluminum doping on structural, optical and electrical properties are studied as function of dopant concentration, which was varied between 0 and 5 %. X-ray diffraction indicates that all the films exhibit hexagonal wurtzite structure and has polycrystalline nature. The preferential growth showed a variation depending on the doping ratios. Transmission measurements showed that for visible wavelengths, the AZO films have an average transmission of over 80%. The lowest resistivity was found to be 0.2 Ω.cm with a carrier concentration of 6.2 10 cm and high transmittance of 90 % at 550 nm after annealing.
机译：在350℃下通过化学喷雾热解法在玻璃基板上制备了ZnO和Al掺杂的ZnO（AZO）薄膜。在这一贡献中，研究了铝掺杂对结构，光学和电学性质的影响，该影响是掺杂剂浓度的函数，掺杂剂浓度在0％和5％之间变化。 X射线衍射表明，所有膜均显示六方纤锌矿结构并具有多晶性质。优先生长显示出取决于掺杂率的变化。透射率测量表明，对于可见波长，AZO薄膜的平均透射率超过80％。发现最低电阻率是0.2Ω.cm，载流子浓度为6.2 10 cm，退火后在550 nm处的透射率为90％。

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