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Electron concentration behavior in junctionless vs junction SOI n-MOSFET transistor

机译:无结与结SOI n-MOSFET晶体管中的电子浓度行为

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In this paper, the effect of gate workfunction variation on electron concentration at depletion and inversion as a function of applied gate voltage for 100 nm gate length silicon-on-insulator (SOI) junctionless (JLT) and junction (JT) transistors are investigated. It shows that the JLT device is properly function and achieving full-depletion without losing gate controllability at higher gate workfunction of more than 5.0 eV whereas the designated JT device is more wider range, ranging from low, mid-gap or high workfunction.
机译:在本文中,研究了栅极功函数变化对耗尽和反转时电子浓度随100 nm栅极长度绝缘体上无结(JLT)和结(JT)晶体管施加的栅极电压的影响。它表明,在大于5.0 eV的较高栅极功函数下,JLT器件可以正常工作并实现全耗尽而不会失去栅极可控性,而指定的JT器件的范围更广,范围从低,中间隙或高功函数。

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