Transparent mask design and fabrication of interdigitated electrodes

机译：指状电极的透明掩模设计与制作

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Fabrication of Interdigitated Electrodes (IDEs) involves several processes which include oxidation, metallization and photolithography. Among these three processes, photolithography process is the most critical part in the fabrication of IDEs. Photolithography refers to the process of pattern definition by transferring the desired design patterns from a photo-mask/chrome-mask to photoresist (thin uniform layer of viscous liquid) on the wafer surface. Thus, printed transparent masks' resolution plays an important role in photolithography process. This will affect the dimension of pattern transfer to the photoresist and hence influences the functionality of IDEs indirectly due to the low resolution of the printed mask. Consequently, the dimension of IDEs' design is compared among the design in AutoCAD tool, printed mask and fabricated device.

机译：叉指电极（IDE）的制造涉及多个过程，包括氧化，金属化和光刻。在这三个过程中，光刻过程是IDE制造中最关键的部分。光刻是指通过将所需的设计图案从光掩模/铬掩模转移到晶片表面上的光刻胶（粘性液体的薄而均匀的层）来进行图案定义的过程。因此，印刷的透明掩模的分辨率在光刻过程中起着重要的作用。由于印刷掩模的分辨率低，这将影响图案转移到光致抗蚀剂的尺寸，并因此间接影响IDE的功能。因此，将IDE设计的尺寸在AutoCAD工具，印刷掩模和装配好的设备中进行了比较。

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《IEEE Regional Symposium on Micro and Nano Electronics》|2015年|1-4|共4页
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Adelyn P.Y.P; Hashim U.; Ha Y.P.; Arshad M.K.Md; Ruslinda A.R; Ayub R.M.; Gopinath Subash C.B.; Voon C.H.; Foo K.L;
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Electrodes; Etching; Fabrication; Inspection; Lithography; Printing; Resists; Inkjet Printing; Interdigitated Electrode (IDEs); Low cost; Photolithography; Transparent mask;

机译：电极;蚀刻;制造;检查;平版印刷;印刷;抵抗;喷墨打印;叉指电极（IDE）;低成本;光刻;透明面膜;

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4. Transparent mask design and fabrication of interdigitated electrodes [C] . Adelyn P.Y.P, Hashim U., Ha Y.P., IEEE Regional Symposium on Micro and Nano Electronics . 2015

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Transparent mask design and fabrication of interdigitated electrodes

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