首页> 外文会议>Conference on Lasers and Electro-Optics Pacific Rim >SiO2 clad active and passive photonic crystal nanocavity devices fabricated with photolithography: Toward future mass production of photonic crystal nanocavity devices
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SiO2 clad active and passive photonic crystal nanocavity devices fabricated with photolithography: Toward future mass production of photonic crystal nanocavity devices

机译:用光刻技术制备的SiO 2 包覆有源和无源光子晶体纳米腔器件:走向未来光子晶体纳米腔器件的批量生产

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We describe the fabrication and a demonstration of passive and active photonic crystal nanocavity devices, namely an electro-optic modulator, an all-silicon photodetector and a DeMUX filter. This is the first demonstration of active and passive photonic crystal nanocavity devices fabricated with a photolithographic process that may lead to future mass production.
机译:我们描述了无源和有源光子晶体纳米腔器件的制造和演示,即电光调制器,全硅光电探测器和DeMUX滤波器。这是采用光刻工艺制造的有源和无源光子晶体纳米腔器件的首次演示,这可能会导致未来的批量生产。

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