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Electrically alterable read-only memory cell with graded energy band-gap insulator

机译:具有梯度能带隙绝缘体的电可变只读存储单元

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Low voltage alterability and excellent memory retention have been obtained with a novel EAROM cell that has a graded energy band-gap film as the first insulator of a Floating-Gate type memory. The graded energy band-gap insulator can enhance charge injection without deteriorating memory retention, because the energy band-gap is narrowed only at the silicon substrate interface. A graded energy band-gap insulator has been realized by thermally oxidizing the surface of a very thin silicon nitride film grown by direct thermal nitridation of a silicon substrate. A fabricated EAROM cell has shown that it can be programmed by a single positive supply of less than 12 V and it has excellent memory retention.
机译:用具有梯度能带隙膜的新型EAROM单元作为浮栅型存储器的第一绝缘体已经获得了低电压可变性和优异的存储器保持性。梯度能带隙绝缘体可以增强电荷注入,而不会降低存储能力,因为能带隙仅在硅衬底界面处变窄。通过热氧化通过硅衬底的直接热氮化而生长的非常薄的氮化硅膜的表面,已经实现了梯度能带隙绝缘体。制成的EAROM单元表明,可以通过低于12 V的单正电源对其进行编程,并且具有出色的存储保持力。

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