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Microstructural analysis of Nb-doped anatase TiO2 transparent conductive films by transmission electron microscopy

机译:通过透射电子显微镜进行Nb掺杂锐钛矿TiO2透明导电膜的微观结构分析

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We investigated microstructures and transport properties of Nb-doped anatase TiO2 (TNO) films deposited by two methods: sputtering and pulsed laser deposition (PLD).We found that working pressure (Pw) of sputtering has a significant influence on both microstructures and transport properties. Cross-sectional observation by transmission electron microscopy revealed that lowered Pw improved homogeneity in the microstructure. This finding indicates that the inhomogeneous microstructure of the sputtered TNO films is not due to sputtering damage but to fluctuation in mass density. A sputtered film deposited at Pw = 0.50 Pa exhibited homogeneous microstructure and high Hall mobility comparable to those of PLD films.
机译:我们研究了两种方法沉积的Nb掺杂锐钛矿TiO2(TNO)膜的微观结构和运输性能:溅射和脉冲激光沉积(PLD)。我们发现溅射的工作压力(PW)对微观结构和运输性能有显着影响。透射电子显微镜的横截面观察显示,降低PW改善了微观结构的均匀性。该发现表明,溅射的TNO膜的不均匀微观结构不是由于溅射损坏,而是在质量密度的波动。沉积在PW = 0.50Pa的溅射膜表现出与PLD薄膜相当的均匀微观结构和高霍尔迁移率。

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