首页> 外文会议> >MEASUREMENT OF VERTICALLY ALIGNED CARBON NANOTUBE ARRAY BULK FRICTION IN CONTACT WITH SILICON: NANOTRIBOLOGY IV - CARBON-BASED MATERIALS (HOPG, CNT, DLC)
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MEASUREMENT OF VERTICALLY ALIGNED CARBON NANOTUBE ARRAY BULK FRICTION IN CONTACT WITH SILICON: NANOTRIBOLOGY IV - CARBON-BASED MATERIALS (HOPG, CNT, DLC)

机译:与硅接触的垂直对准碳纳米管阵列大摩擦的测量:纳米摩擦学IV-碳基材料(HOPG,CNT,DLC)

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摘要

Arrays of Vertically Aligned Carbon Nanotubes (VACNT) have been utilized in bulk form to measure the indentation response and friction coefficients in contact with polished silicon wafers. A section of 1 mm long VACNTs, which has a contact area of ~3mm~2, was mounted with epoxy to a cylindrical aluminum stub of 4mm in diameter, and installed in a commercial nanoindenter which has long-range lateral translation capabilities. When load-displacement hysteresis measurements were performed on a silicon wafer, the VACNT array was found to stiffen with increasing load, have a larger unloading slope, and more residual deformation. Friction measurements were performed by contacting the silicon wafer and translating the silicon sample during a load-controlled scan.
机译:垂直排列的碳纳米管(VACNT)的阵列已被用于散装形式,以测量与抛光硅晶片接触的压痕响应和摩擦系数。用环氧树脂将直径为1mm长的VACNTs的一部分用环氧树脂固定在直径为4mm的圆柱形铝棒上,并安装在具有远距离横向平移能力的商用纳米压头中。当在硅晶片上执行载荷-位移滞后测量时,发现VACNT阵列会随着载荷的增加而变硬,具有更大的卸载斜率和更多的残余变形。摩擦测量是通过在负载控制的扫描过程中接触硅晶片并平移硅样品进行的。

著录项

  • 来源
    《》|2009年|P.305-307|共3页
  • 会议地点 Lake Buena Vista FL(US)
  • 作者单位

    Department of Mechanical Engineering, State University of New York at Stony Brook Stony Brook, NY 11794-2300;

    rnDepartment of Mechanical Engineering, State University of New York at Stony Brook Stony Brook, NY 11794-2300;

    rnDepartment of Mechanical Engineering, State University of New York at Stony Brook Stony Brook, NY 11794-2300;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 机械摩擦、磨损与润滑;
  • 关键词

    nanotribology; materials (in tribology);

    机译:纳米摩擦学材料(摩擦学);

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