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DFWM reflectivity via two-photon free carrier generation in semiconductors in middle-IR range

机译:DFWM在中红外IR范围内的半导体中的双光子自由载波的反射率

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It's shown that the effect of two-photon free carrier generation (TFCG) in semiconductors is the most promising for achieving high DFWM reflectivities R with short enough decay time tau in wavelength range from 1.5 to greater than 9.5 micrometers. The materials which allow us to achieve R up to 100% with tau of order of nanoseconds for the range of interest are presented. Some specific features of DFWM via TFCG were studied experimentally in InSb at lambda equals 10.6 micrometers and in Ge at lambda equals 2.94 micrometers.
机译:结果表明,二光子自由载体生成(TFCG)在半导体中的效果是实现高DFWM反射率R的最有希望,其具有足够短的衰减时间TAU,波长范围为1.5至大于9.5微米。展示了允许我们达到100%的材料,纳入纳秒的纳秒达到100%,以获得感兴趣的范围。通过TFCG在Lambda的INSB中实验研究DFWM的一些特定特征等于10.6微米,在Lambda等于2.94微米。

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