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Porous Silicon 2D Photonic Crystals

机译:多孔硅2D光子晶体

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Porous silicon (Psi) is an attractive material for fabrication of multilayer optical devices such as Bragg reflectors, Fabry-Perot resonators and other novel (optical) components. Such devices are characterized by a periodic modulation of the refractive indices in alternating layers and can be classified as 1D photonic crystals. 2D photonic bandgap structures can be also obtained using a variation of applied potential on the back side of the sample during electrochemical formation of the multilayers. This technique allows a fabrication of spatially distributed filters on the millimeter size scale. In this paper, a new method is presented which uses a front side protective mask for the creation of 2D photonic bandgap structures on the micron scale. The devices obtained by this technique can be used for the creation of spatially distributed filters. The front side protective mask controls lateral undercut in multiple ways depending on the mask material. By varying the design and material of the protective mask, Psi interference filters with desired optical parameters across a field of view can be realized. In this paper, a novel, simple method to produce 2D periodic multilayer structures is described. In particular, the focus is on the changes in the photonic crystal cavities when various mask materials are used. In addition, a new type of active optical components for a chip-to chip interconnection based on the combination of our method and MEMS technology is presented.
机译:多孔硅(PSI)是一种有吸引力的材料,用于制造多层光学装置,例如布拉格反射器,法布里 - 珀罗谐振器和其他新颖(光学)部件。这种装置的特征在于交替层中的折射率的周期性调制,并且可以被分类为1D光子晶体。 2D光子带隙结构也可以在多层电化学形成期间使用样品背面的施加电位的变化来获得。该技术允许在毫米尺寸尺度上制造空间分布的滤波器。在本文中,提出了一种使用前侧保护掩模的新方法,用于在微米级上产生2D光子带隙结构。通过该技术获得的设备可用于在空间分布式滤波器的创建。前侧保护罩以多种方式控制横向底切,这取决于掩模材料。通过改变保护掩模的设计和材料,可以实现具有视野上的具有所需光学参数的PSI干扰滤波器。在本文中,描述了一种生产2D周期性多层结构的新颖,简单的方法。特别地,当使用各种掩模材料时,重点是光子晶体腔的变化。另外,提出了一种基于我们的方法和MEMS技术的组合的芯片到芯片互连的新型有源光学组件。

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