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首页> 外文会议>Energy Technologies Symposium >Determination of Limiting Current Density, Plateau Length, and Ohmic Resistance of a Heterogeneous Membrane for the Treatment of Industrial Wastewaters with Copper Ions in Acid Media
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Determination of Limiting Current Density, Plateau Length, and Ohmic Resistance of a Heterogeneous Membrane for the Treatment of Industrial Wastewaters with Copper Ions in Acid Media

机译：酸性介质中铜离子工业废水处理用非均相膜极限电流密度、平台长度和欧姆电阻的测定

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In the last years, the electrodialysis process has been considered as an alternative to the chemical precipitation for the treatment of wastewaters from electroplating industries due to some limitations involved in the precipitation, as the sludge formation. For the success of the electrodialysis, some membranes properties have to be evaluated and the chronopotentiometry technique can be used. Hence, the present paper aimed at using chronopotentiometry for determining the limiting current density, plateau length, and ohmic resistance of the cationic heterogeneous HDX100 membrane by constructing current-voltage curves. The synthesized solution of the effluent from the electroplating industry evaluated was prepared with copper sulfate and sulfuric acid (2 g Cu~(2+)/L and pH 2). The chronopotentiometric curves were also evaluated for the study of the precipitate formation. According to the results, typical curves of monopolar membranes were obtained and the properties could be effectively determined by chronopotentiometry.
机译：在过去几年中，由于沉淀过程中的一些限制，例如污泥的形成，电渗析工艺被认为是化学沉淀的替代方法，用于处理电镀行业废水。为了电渗析的成功，必须评估一些膜的性能，并且可以使用计时电位测定技术。因此，本论文旨在通过构建电流-电压曲线，利用计时电位法测定阳离子非均相HDX100膜的极限电流密度、平台长度和欧姆电阻。用硫酸铜和硫酸（2 g Cu~（2+）/L，pH 2）制备了电镀工业废水的合成溶液。为了研究沉淀的形成，还对计时电位曲线进行了评估。根据实验结果，得到了单极性膜的典型曲线，利用计时电位法可以有效地测定膜的性能。

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