首页> 外文会议>Conference on Metrology, Inspection, and Process Control for Microlithography XXXIII >Process drift compensation by tunable wavelength homing in scatterometry-based overlay
【24h】

Process drift compensation by tunable wavelength homing in scatterometry-based overlay

机译:通过可调谐波长在散射仪的覆盖层中进行可调谐波长的处理漂移补偿

获取原文

摘要

Shrinking on-product overlay (OPO) budgets in advanced technology nodes require more accurate overlay measurementand better measurement robustness to process variability. Pupil-based accuracy flags have been introduced to thescatterometry-based overlay (SCOL?) system to evaluate the performance of a SCOL measurement setup. WavelengthHoming? is a new robustness feature enabled by the continuous tunability of advanced SCOL systems using asupercontinuum laser light source in combination with a flexible bandpass filter. Inline process monitoring using accuracyflags allows for detection, quantification and correction of shifts in the optimal measurement wavelength. This workdemonstrates the benefit of Wavelength Homing in overcoming overlay inaccuracy caused by process changes andrestoring the OPO and residual levels in the original recipe.
机译:在高级技术节点中缩小产品覆盖(OPO)预算需要更准确的叠加测量更好的测量稳健性来处理变异性。介绍了基于瞳孔的精度标志基于散射仪的覆盖(SCOL?)系统来评估SCOL测量设置的性能。波长归巢?是一种新的稳健性功能,通过使用A高级SCOL系统的连续可调性启用超强素um激光光源与柔性带通滤波器组合。内联进程监控使用准确性标志允许检测,定量和校正在最佳测量波长中的变化。这项工作展示了波长宿主在克服过程变化和过程变化引起的覆盖不准确性中的益处在原始配方中恢复OPO和残余级别。

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号