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Multilevel Nanoscale DOE Optimization, Fabrication, and Replication

机译:多级纳米DOE优化,制造和复制

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In this paper, we employ a wavelet-based electromagnetic optimization algorithm to enhance multilevel diffractive lens performance. As we show in this paper, the optimized performance and iteration time is very much a function of the initial lens profile. To demonstrate this we analyze various types of initial profiles ranging from scalar-based lenses to flat and random structures. Additionally, we characterize the performance of replicated multilevel lenses fabricated using a soft lithographic technique known as nanoimprint lithography (NIL). Experimental results are presented.
机译:在本文中,我们采用基于小波的电磁优化算法来增强多级衍射透镜的性能。如我们在本文中所示,优化的性能和迭代时间很大程度上取决于初始镜头配置文件。为了证明这一点,我们分析了各种类型的初始轮廓,从基于标量的透镜到平面和随机结构。此外,我们表征了使用称为纳米压印光刻(NIL)的软光刻技术制造的复制多层透镜的性能。给出实验结果。

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