首页> 外文会议>Conference on infrared technology and applications >Reduction of dark current density by five orders at high bias and enhanced multicolour photo response at low bias for quaternary alloy capped InGaAs/ GaAs QDIPs, when implanted with low-energy light (H-) ions
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Reduction of dark current density by five orders at high bias and enhanced multicolour photo response at low bias for quaternary alloy capped InGaAs/ GaAs QDIPs, when implanted with low-energy light (H-) ions

机译:当植入低能量光(H-)离子时,在低偏置下的高偏置和增强的多色照片响应下减少暗电流密度的五个订单和增强的多色照片响应。

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Considering the importance of In(Ga)As/GaAs QDIPs, a post-growth method had been developed for enhancing QDIP characteristics using low energy light ion (H) implantation. Dark current density was reduced by about five orders for the implanted devices due to the reduction in field assisted tunneling process for dark current generation, even at a very high bias of operation. Stronger multicolor mid wavelength photo response (~5.6 μm) was achieved at a very low bias of operation for the implanted device.
机译:考虑到(GA)AS / GaAs Qdips的重要性,已经开发了使用低能量光离子(H)植入来提高QDIP特性的生长后的方法。由于暗电流发电的现场辅助隧道工艺的减少,植入装置的暗电流密度减小了约五个订单,即使在暗电流发电的情况下,即使在非常高的操作偏差上也是如此。在植入装置的操作非常低的操作中,实现了更强的多色中波长照片响应(〜5.6μm)。

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