首页> 外文会议>Nanotechnology VI >Optical absorption cross section and quantum efficiency of a single silicon quantum dot
【24h】

Optical absorption cross section and quantum efficiency of a single silicon quantum dot

机译:单个硅量子点的光吸收截面和量子效率

获取原文
获取原文并翻译 | 示例

摘要

Direct measurements of the optical absorption cross section(a)and exciton lifetime are performed on a single silicon quantum dot fabricated by electron beam lithography(EBL), reactive ion etching(RIE)and oxidation. For this aim, single photon counting using, an avalanche photodiode detector(APD)is applied to record photoluminescence(PL)intensity traces under pulsed excitation. The PL decay is found to be of a mono-exponential character with a lifetime of 6.5 μs. By recording the photoluminescence rise time at different photon fluxes the absorption cross could be extracted yielding a value of 1.46×10~(-14)c㎡ under 405 run excitation wavelength. The PL quantum efficiency is found to be about 9% for the specified single silicon quantum dot.
机译:通过电子束光刻(EBL),反应离子刻蚀(RIE)和氧化制备的单个硅量子点可直接测量光吸收截面(a)和激子寿命。为此,使用雪崩光电二极管检测器(APD)进行单光子计数以记录脉冲激发下的光致发光(PL)强度轨迹。发现PL衰减具有6.5μs的单指数特性。通过记录在不同光子通量下的光致发光上升时间,可以提取吸收交叉,在405nm激发波长下产生的吸收值为1.46×10〜(-14)c㎡。对于指定的单个硅量子点,发现PL量子效率约为9%。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号