The Joining of LiNbO_3, Quartz, Tibr-Tli and Other Optical Materials by the Use of Thin Metal Films as Bonding Agents

机译：通过使用金属薄膜作为粘合剂将LiNbO_3，石英，Tibr-Tli和其他光学材料连接起来

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A method of joining ferroelectric, optical and other non-metallic materials, such as lithium niobate, quartz, TlBr-TlI, glass, etc., at room temperaure under a pressure of 0.1/0.5 MPa is described. The surfaces to be joined are prepared to optical flatness, and indium or lead coatings as bonding agents are used. To obtain clean surface,s procedures of the coating deposition and sample joining are performed in situ in a vacuum of 10~-4 Pa. The strength of the obtained joints is about 20MPa for indium coatings and about 30MPa for lead coatings. It is supposed that attractive surface forces play a decisive role in the contact formation and bonding of the wafers. The method has been applied for joining of LiNbO_3/TlBr-TlI, quartz/quartz and other materials to make acoustooptical and electroacoustic devices.

机译：描述了一种在室温下以0.1 / 0.5 MPa的压力连接铁电，光学和其他非金属材料的方法，例如铌酸锂，石英，TlBr-TlI，玻璃等。将待连接的表面制备为具有光学平坦度，并使用铟或铅涂层作为粘合剂。为了获得清洁的表面，在10〜-4 Pa的真空中原位执行涂层沉积和样品接合的步骤。对于铟涂层，所获得的接头强度约为20MPa，对于铅涂层，其接头强度约为30MPa。据推测，有吸引力的表面力在晶片的接触形成和键合中起决定性作用。该方法已应用于LiNbO_3 / TlBr-TlI，石英/石英和其他材料的连接，以制造声光和电声器件。

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《NATO Advanced Research Workshop on Defects and Surface-Induced Effects in Advanced Perovskites Jurmala, Latvia 23-25 August 1999》|1999年|p.267-272|共6页
会议地点 Jurmala(LV)
作者
J.Maniks A.Simanovskis;
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正文语种 eng
中图分类地质学;
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The Joining of LiNbO_3, Quartz, Tibr-Tli and Other Optical Materials by the Use of Thin Metal Films as Bonding Agents

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