STRUCTURE AND MECHANICAL PROPERTIES OF NANOSTRUCTURED METAL-CARBON FILMS

机译：纳米结构金属碳膜的结构和力学性能

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Nanocrystalline copper/hydrogenated amorphous carbon (nc-Cu/a-C:H) films have been deposited on Si substrates by a microwave plasma-enhanced chemical vapor deposition process combined with a sputter deposition process. The deposition rate of films was found to vary in the range of 15 to 25 nm/min depending on the composition of argon-methane mixtures. These films were analyzed by Rutherford backscattering spectroscopy and Raman spectroscopy. The crystallographic structure, nanohardness, and friction coefficient of films were investigated as functions of the carbon content.

机译：纳米晶铜/氢化非晶碳（nc-Cu / a-C：H）膜已通过微波等离子体增强化学气相沉积工艺与溅射沉积工艺相结合沉积在Si基板上。发现膜的沉积速率在15至25nm / min的范围内变化，这取决于氩-甲烷混合物的组成。这些膜通过卢瑟福反向散射光谱和拉曼光谱分析。研究了薄膜的晶体结构，纳米硬度和摩擦系数与碳含量的关系。

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《NATO Advanced Research Workshop on Nanostructured Materials and Coatings for Biomedical and Sensor Applications Aug 4-8, 2002 Kyiv, Ukraine》|2002年|p.175-180|共6页
会议地点 Kyiv(UA)
作者
Y. PAULEAU; F. THIERY; J. PELLETIER; V.V. UGLOV; A.K. KULESHOV; S.N. DUB; M.P. SAMTSOV;
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作者单位

Centre National de la Recherche Scientifique, LEMD, Grenoble, France;

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原文格式 PDF
正文语种 eng
中图分类基础医学;
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STRUCTURE AND MECHANICAL PROPERTIES OF NANOSTRUCTURED METAL-CARBON FILMS

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