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LORENTZ IMAGING OF SUB-MICRON PATTERNED ELEMENTS

机译:亚微米图案化元素的洛伦兹成像

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This work has shown that Lorentz imaging in the TEM can reveal the properties of nanoscale magnetic elements of NiFe and Co down to 200nm x 40nm. To achieve ultra-high density patterned media which are competitive with record storage densities achieved using conventional media it is necessary to make smaller elements, with a lower aspect ratio, as close together as possible. For example, we have produced Ni elements down to ultra-small sizes of 25nm x 45nm which would correspond to an areal density of 184Gbit/in~2 but as yet have not measured their properties. There have also been other recent reports. Cheap methods of mass production would also be necessary such as imprinting, embossing, or modification of a continuous film . Comparing NiFe and Co elements for patterned media, the Co elements looked more suitable since they retained a consistent switching field down to a lower aspect ratio than the NiFe elements and had a relatively smaller spread of switching fields. The patterned elements have a much lower coercivity than the high anisotropy continuous media under development and therefore do not present such a problem for miniaturised write heads. Interactions between the elements had an effect, but the switching patterns were determined more by the variation in the properties of individual elements. It was encouraging that interactions were relatively small, suggesting that higher density arrays will be feasible.
机译:这项工作表明,TEM中的洛伦兹成像可以揭示低至200nm x 40nm的NiFe和Co纳米级磁性元素的特性。为了获得与使用传统介质所达到的记录存储密度相竞争的超高密度图案化介质,必须使纵横比较小的较小元件尽可能靠近。例如,我们生产的镍元素小至25nm x 45nm的超小尺寸,相当于184Gbit / in〜2的面密度,但尚未测量其性能。最近也有其他报道。廉价的大规模生产方法也将是必要的,例如压印,压花或修饰连续膜。比较用于图案化介质的NiFe和Co元素,Co元素看起来更合适,因为与NiFe元素相比,Co元素保持一致的开关场,直至其长宽比更低,并且开关场的分布相对较小。图案化的元件具有比正在开发的高各向异性连续介质低得多的矫顽力,因此对于小型化的写头不存在这样的问题。元素之间的相互作用会产生影响,但是切换模式更多地取决于单个元素的属性变化。令人鼓舞的是,相互作用相对较小,这表明更高密度的阵列将是可行的。

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