By placing a thin wire near a coated conducting substrate one can generate high electric fields approaching 30 V/μm. These high electric fields can be used to detach toners from a donor roll in a development nip which can subsequently be developed with smaller electric fields from a latent image. Toners typically have large variations in shape, size, and charge, and thus adhesion. A DC voltage on the wire removes only a small proportion of the particles. If alternatively positive and negative voltages are applied to the wire, the particles removed during the attractive part of the pulse are pushed back to the substrate when the voltage flips. The particle impacts loosen up the remaining particles and the next voltage flip removes more particles. By photographing the area under the wire with a digital camera, we can determine the mass removed as a function of distance from the wire. We use this information to monitor the fraction of particles remove as a function of voltage, frequency, number of particles on the substrate and number of pulses in order to extract the physics of the bombardment process. We find that bombardment can completely remove all particles from the substrate, even when a small fraction are initially removed.
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机译：通过在涂覆的导电基板附近放置细线，可以产生接近30 V /μm的高电场。这些高电场可用于从显影辊隙中的供体辊上分离出色粉，随后可从潜像中以较小的电场对其进行显影。碳粉通常在形状，大小和电荷以及附着力方面有很大的差异。电线上的直流电压只能去除一小部分颗粒。如果将正负电压交替施加到导线，则当电压翻转时，在脉冲的吸引部分去除的颗粒将被推回到基板上。粒子碰撞使剩余的粒子松动，下一次电压翻转将去除更多的粒子。通过用数码相机拍摄电线下面的区域，我们可以确定去除的质量与电线距离的函数。我们使用此信息来监控作为电压，频率，基板上的粒子数和脉冲数的函数的粒子去除率，以提取轰击过程的物理原理。我们发现，轰炸可以完全清除基材上的所有颗粒，即使最初只清除了一小部分。
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