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Nanofabrication with sub-50nm features by imprinting-induced cracks

机译:压印引起的裂纹,具有低于50nm特征的纳米加工

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摘要

Nanofabrication is the foundation of nanophotonics and has become a research hotspot in the last decades. The method annealing crack is proposed to transfer the nanocracks from ultraviolet (UV) resist to other photonic materials. The method is demonstrated by simulating the inner stress distribution with the thermal-structure analysis. In addition, the parameter influence to the maximum stress is discussed and the results indicate that the annealing temperature has a large effect. The method is simple, low cost, high efficiency and is a good candidate to fabricate nanophotonic structures with critical size less than 50nm.
机译:纳米制造是纳米光子学的基础,并且在过去的几十年中已经成为研究的热点。提出了退火裂纹的方法,以将纳米裂纹从紫外线(UV)抗蚀剂转移到其他光子材料。通过热结构分析模拟内部应力分布,证明了该方法。此外,讨论了参数对最大应力的影响,结果表明退火温度影响很大。该方法简单,成本低,效率高,是制备临界尺寸小于50nm的纳米光子结构的理想选择。

著录项

  • 来源
    《Optical design and testing VI》|2014年|92720K.1-92720K.5|共5页
  • 会议地点 Beijing(CN)
  • 作者单位

    Key Laboratory of Multi-scale Manufacturing Technology, Chongqing institute of green and intelligent technology, Chinese Academy of Sciences, Chongqing, 401122, China;

    Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China;

    Key Laboratory of Multi-scale Manufacturing Technology, Chongqing institute of green and intelligent technology, Chinese Academy of Sciences, Chongqing, 401122, China;

    Key Laboratory of Multi-scale Manufacturing Technology, Chongqing institute of green and intelligent technology, Chinese Academy of Sciences, Chongqing, 401122, China;

    Key Laboratory of Multi-scale Manufacturing Technology, Chongqing institute of green and intelligent technology, Chinese Academy of Sciences, Chongqing, 401122, China;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Nanofabrication; crack; sub-50nm; nanophotonics;

    机译:纳米加工;裂纹; 50nm以下;纳米光子学;

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