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Measurements of index of refraction in the deep and vacuum ultraviolet using the minimum-deviation method

机译：使用最小偏差法测量深紫外和真空紫外中的折射率

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Abstract: We discuss a procedure for making accurate measurement of the index of refraction, its dispersion, and its temperature dependence, in the deep ultraviolet (near 193 nm), using precision goniometric spectrometers and the minimum deviation method. Measurements of the indices of fused silica and calcium fluoride near 193 nm, with a fractional accuracy of 7 ppm, are discussed. These measurements revealed differences in the indices between different grades of fused silica. Accurate values of the temperature dependencies were determined from measurements of the indices at several temperatures in a 20 degree Celsius range about 20 degrees Celsius. A procedure to measure the index of calcium fluoride in the vacuum ultraviolet region (157 nm) using a N$-2$/ purge housing is discussed. !8
机译：摘要：我们讨论了一种使用精密测角光谱仪和最小偏差法在深紫外（193 nm附近）中准确测量折射率，色散和温度依赖性的方法。讨论了在193 nm附近测量熔融石英和氟化钙的折射率，分数精度为7 ppm。这些测量揭示了不同等级的熔融二氧化硅之间的指数差异。温度依赖性的准确值是根据在20摄氏度左右（约20摄氏度）的几个温度下的指数测量值确定的。讨论了使用N $ -2 $ /吹扫外壳测量真空紫外区（157 nm）中氟化钙的指数的程序。 ！8

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