Global source optimization for MEEF and OPE

著录项

• 来源
  《Optical microlithography XXVI》|2013年|86830O.1-86830O.7|共7页
• 会议地点 San Jose CA(US)
• 作者

  Ryota Matsui; Tomoya Noda; Hajime Aoyama; Naonori Kita; Tomoyuki Matsuyama; Donis Flagello;

  展开▼
• 作者单位

  Nikon Corporation, 2-65-2 Nakacho, Omiya, Saitama, Japan 330-0845;

  Nikon Corporation, 2-65-2 Nakacho, Omiya, Saitama, Japan 330-0845;

  Nikon Corporation, 2-65-2 Nakacho, Omiya, Saitama, Japan 330-0845;

  Nikon Corporation, 2-65-2 Nakacho, Omiya, Saitama, Japan 330-0845;

  Nikon Corporation, 2-65-2 Nakacho, Omiya, Saitama, Japan 330-0845;

  Nikon Research Corporation of America, 12490 Rancho Vistoso, Oro Valley, Arizona 85737, USA;

  展开▼
• 会议组织
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  Freeform source optimization; Source Mask Optimization (SMO); Mask Error Enhancement Factor (MEEF); Optical Proximity Effect (OPE); Linear Program (LP); Intelligent Illuminator; Source grid dependency;

  机译：自由格式源优化；源模板优化（SMO）；掩码错误增强因子（MEEF）；光学邻近效应（OPE）；线性程序（LP）；智能照明器；源网格依赖性;