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Evaluation of the ultraviolet/ozone technique for on-orbit removal of photolyzed molecular contamination from optical surfaces

机译:紫外/臭氧技术在轨去除光学表面光解分子污染的评估

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Abstract: Molecular species outgassed from spacecraft materials adhere tenaciously to and darken spacecraft surfaces when exposed to solar ultraviolet (UV) radiation. Such deposits severely degrade the performance of optical systems operating at UV and visible wavelengths. Data is presented which demonstrates the feasibility of a UV/Ozone cleaning technique in removing such deposits in a space-compatible configuration without damage to the optical surface. The technique involves the UV irradiation of the optical surface in the presence of low pressure molecular oxygen, resulting in the photolytic formation of ozone (O$-3$/) and subsequent photochemical removal of the contamination.!12
机译:摘要:当暴露于太阳紫外线(UV)时,从航天器材料释放的分子物质会顽强地附着在航天器表面并使表面变暗。这样的沉积物严重降低了在紫外线和可见光波长下工作的光学系统的性能。所提供的数据证明了采用紫外线/臭氧清洁技术以空间兼容的配置去除此类沉积物而不损坏光学表面的可行性。该技术涉及在存在低压分子氧的情况下对光学表面进行紫外线照射,导致臭氧的光解形成(O $ -3 $ /),并随后通过光化学去除污染物!12

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