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首页> 外文会议>Optics for EUV, x-ray, and gamma-ray astronomy VII >Development of Ni-based multilayers for future focusing soft gamma ray telescopes
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Development of Ni-based multilayers for future focusing soft gamma ray telescopes

机译：镍基多层膜的开发，用于未来聚焦的软伽玛射线望远镜

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Ni-based multilayers are a possible solution to extend the upper energy range of hard X-ray focusing telescopes currently limited at ≈ 79.4 keV by the Pt-K absorption edge. In this study 10 bilayers multilayers with a constant bilayer thickness were coated with the DC magnetron sputtering facility at DTU Space, characterized at 8 keV using X-ray reflectometry and fitted using the IMD software. Ni/C multilayers were found to have a mean interface roughness ≈ 1.5 times lower than M/B_4C multilayers. Reactive sputtering with ≈ 76% of Ar and ≈ 24% of N_2 reduced the mean interface roughness by a factor of ≈ 1.7. It also increased the coating rate of C by a factor of ≈ 3.1 and lead to a coating process going ≈ 1.6 times faster. Honeycomb collimation proved to limit the increase in mean interface roughness when the bilayer thickness increases at the price of a coating process going ≈ 1.9 times longer than with separator plates. Finally a Ni/C 150 bilayers depth-graded mutilayer was coated with reactive sputtering and honeycomb collimation and then characterized from 10 keV to 150 keV. It showed 10% reflectance up to 85 keV.
机译：镍基多层是扩展硬X射线聚焦望远镜能量上限的一种可能的解决方案，该望远镜目前受Pt-K吸收边限制在≈79.4 keV。在这项研究中，用DTU Space的DC磁控溅射设备涂覆了具有恒定双层厚度的10个双层多层膜，使用X射线反射仪将其表征为8 keV，并使用IMD软件进行装配。发现Ni / C多层膜的平均界面粗糙度比M / B_4C多层膜低约1.5倍。 Ar≈76％和N_2≈24％的反应溅射使平均界面粗糙度降低了≈1.7倍。它还将C的涂覆率提高了约3.1倍，并导致涂覆过程快了约1.6倍。事实证明，当双层厚度以涂层工艺为代价而增加了≈1.9倍于隔板时，蜂窝状准直限制了平均界面粗糙度的增加。最后，用反应溅射和蜂窝状准直涂覆Ni / C 150双层深度渐变多层膜，然后表征为10 keV至150 keV。它显示了高达85 keV的10％反射率。

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