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首页> 外文会议>Optics and measurement confercnec 2014 >Optical properties of Fe_2O_3 deposited by IBAD and its usage in interference filters
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Optical properties of Fe_2O_3 deposited by IBAD and its usage in interference filters

机译：IBAD沉积Fe_2O_3的光学性质及其在干涉滤光片中的应用

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摘要

This paper deals with thin films of Hematite (Fe_2O_3) deposited by ion beam assisted deposition (IBAD). It describes variation of optical properties with deposition parameters, especially oxygen flow and deposition rate. Optimal deposition parameters for Fe_2O_3 thin film were identified with criterion of the highest possible refractive index and lowest absorption. Film properties were measured and modelled by spectroscopic ellipsometry. Design of Fabry-Perot interference filter was used as a case study to compare properties of a Fe_2O_3 and TiO_2 as a high refractive index materials. The first design uses combination of TiO_2 and SiO_2 layers, which is considered as a standard solution. The second design consists of Fe_2O_3 and YF_3 layers. Comparison of these two designs shows that the design with SiO_2 and Fe_2O_3 has considerably lower layer count. Due to the fact that Fe_2O_3 has significant absorption in the visible spectra its use is limited to red and infrared wavelengths. The paper describes deposition of designed filter (Fe_2O_3 and YF_3) and measurement of its properties. Measured data are compared with the design.
机译：本文研究了通过离子束辅助沉积（IBAD）沉积的赤铁矿（Fe_2O_3）薄膜。它描述了光学性能随沉积参数（尤其是氧气流量和沉积速率）的变化。以最高可能的折射率和最低的吸收为标准，确定了Fe_2O_3薄膜的最佳沉积参数。测量膜性质并通过光谱椭圆偏振法建模。以法布里-珀罗干涉滤光片的设计为例，比较了Fe_2O_3和TiO_2作为高折射率材料的性能。第一种设计使用了TiO_2和SiO_2层的组合，这被认为是标准解决方案。第二种设计由Fe_2O_3和YF_3层组成。两种设计的比较表明，采用SiO_2和Fe_2O_3的设计的层数要低得多。由于Fe_2O_3在可见光谱中具有明显的吸收这一事实，因此其使用仅限于红色和红外波长。该论文描述了设计的滤波器（Fe_2O_3和YF_3）的沉积及其性能的测量。将测得的数据与设计进行比较。

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  • 来源
    《Optics and measurement confercnec 2014》|2014年|944207.1-944207.5|共5页
  • 会议地点 Liberec(CZ)
  • 作者

    Jiri Budasz; Jan Hutka; Jan Vaclavik;

  • 作者单位

    Institute of Plasma Physics AS CR, v.v.i., Department TOPTEC, Za Slovankou 1782/3, 182 00 Prague 8, Czech Republic;

    Institute of Plasma Physics AS CR, v.v.i., Department TOPTEC, Za Slovankou 1782/3, 182 00 Prague 8, Czech Republic;

    Institute of Plasma Physics AS CR, v.v.i., Department TOPTEC, Za Slovankou 1782/3, 182 00 Prague 8, Czech Republic;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Thin film; Hematite; Fe_2O_3; IBAD; evaporation;

    机译：薄膜;赤铁矿; Fe_2O_3;我的错;蒸发;

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