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Processing Technology of Interferogram of thin film thickness Measurement

机译：薄膜厚度测量干涉图的处理技术

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Measuring the thin film thickness by modern interferometry has advantages of the whole test, high precision and non-contact measurement, the kernel of which is to obtain necessary surface shape and parameter by processing interferogram with reasonable algorithms. The pre-treatment of the interferogram is the most crucial and a basal part, which includes the edge identification of based on Mathematical Morphology, regional extension based on the 2-D FFT and unwrapped and wrapped phase based on the non-weighted least squares algorithm for DCT. At the result, surface distribution can be obtained, which lays the groundwork for getting the thin films thickness correctly. In this paper, the image collection of the SiO_2 film and the pretreatment of interferogram is performed. The result indicates that it is basically consistent to the result tested by Zygo interferometer.
机译：利用现代干涉仪测量薄膜厚度具有测试整体，精度高和非接触式测量的优点，其核心是通过用合理的算法处理干涉图来获得必要的表面形状和参数。干涉图的预处理是最关键的基础部分，包括基于数学形态学的边缘识别，基于二维FFT的区域扩展以及基于非加权最小二乘算法的展开和包裹相位用于DCT。结果，可以获得表面分布，这为正确获得薄膜厚度奠定了基础。本文对SiO_2薄膜进行了图像采集和干涉图的预处理。结果表明，它与Zygo干涉仪测试的结果基本一致。

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