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Design and fabrication of photonic crystal thin film photovoltaic cells

机译:光子晶体薄膜光伏电池的设计与制造

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We present the integration of an absorbing planar photonic crystal within a thin film photovoltaic cell. The devices are based on a stack including a hydrogenated amorphous silicon P-i-N junction surrounded by TCO layers, with a back metallic contact. Optical simulations exhibit a significant increase of the integrated absorption in the 300-720nm wavelength range. The global electro-optical characteristics of such a new solar cell, and the impact of surface passivation, are also discussed. Carrier generation rate maps calculated by optical simulations are introduced as input data in a commercial electrical simulation software. The fabrication of such a device is finally addressed, with a specific focus on the use of low cost nanopatterning processes compatible with large areas.
机译:我们目前在薄膜光伏电池内吸收平面光子晶体的集成。这些器件基于一个堆叠,该堆叠包括被TCO层围绕的氢化非晶硅P-i-N结,并具有背面金属触点。光学仿真显示,在300-720nm波长范围内,积分吸收显着增加。还讨论了这种新型太阳能电池的整体电光特性以及表面钝化的影响。通过光学仿真计算出的载流子生成速率图作为输入数据引入到商用电气仿真软件中。最后讨论了这种器件的制造,特别着重于与大面积兼容的低成本纳米图案化工艺的使用。

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