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AFM Evaluation of Silver Halide Material for Holography

机译：全息照相用卤化银材料的AFM评估

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摘要

To record high-resolution holograms successfully, it is necessary to minimize scattering in the recording material. This scattering, in silver halide materials, is caused by initial and final (i.e. after processing) grain-size distributions and by the thickness as well as by the index of refraction variations of the recording medium. Using atomic force microscopy (AFM) we investigated surface topography of representative silver halide holographic recording material. We have applied the trypsin treatment, which was usually used to enhance a surface relief holographic recording, to eliminate the superficial cover layer of gelatine and to render underneath buried grain-size investigation possible. The average grain-size was measured before and after trypsin treatment and the results were compared with Electron-Microscopy measurements. Local hardness of samples under the influence of standard as well as of the surface relief sensitive processing is measured as well.
机译：为了成功地记录高分辨率全息图，必须使记录材料中的散射最小化。卤化银材料中的这种散射是由初始和最终（即加工后）的粒度分布，厚度以及记录介质的折射率变化引起的。使用原子力显微镜（AFM），我们研究了代表性卤化银全息记录材料的表面形貌。我们应用了胰蛋白酶处理，通常用于增强表面浮雕全息记录，消除明胶的表面覆盖层，并可以进行埋藏式粒度调查。在胰蛋白酶处理之前和之后测量平均粒度，并将结果与​​电子显微镜测量结果进行比较。还测量了在标准以及表面起伏敏感处理的影响下样品的局部硬度。

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