首页> 外文会议>Photovoltaic Specialists Conference (PVSC), 2011 37th IEEE >Passivation effect of heterojunction solar cells by amorphous silicon oxide film manufactured using silane and nitrous oxide
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Passivation effect of heterojunction solar cells by amorphous silicon oxide film manufactured using silane and nitrous oxide

机译:硅烷和一氧化二氮制备的非晶氧化硅膜对异质结太阳能电池的钝化作用

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摘要

Hydrogenated amorphous silicon oxide (a-SiO:H) deposited by plasma-enhanced chemical vapor deposition(PECVD) using a mixture of silane (SiH4), hydrogen (H2), and nitrous oxide (N2O) at a low substrate temperature were used as passivation layers for heterojunction solar cells. The ratio of SiH4 to N2O and annealing time were optimized. The heterojunction solar cells manufactured under the optimum conditions exhibited the power conversion efficiency of >;17 %.
机译:使用通过在较低的基板温度下使用硅烷(SiH4),氢气(H2)和一氧化二氮(N2O)的混合物通过等离子体增强化学气相沉积(PECVD)沉积的氢化非晶硅氧化物(a-SiO:H)作为异质结太阳能电池的钝化层。优化了SiH4与N2O的比例和退火时间。在最佳条件下制造的异质结太阳能电池的功率转换效率> 17%。

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