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首页> 外文会议>Physics, simulation, and photonic engineering of photovoltaic devices II >Simulation and Development of Sub-wavelength Textured ARCs for CPV Applications
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Simulation and Development of Sub-wavelength Textured ARCs for CPV Applications

机译：用于CPV应用的亚波长纹理ARC的仿真和开发

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In high ⅩⅢ-Ⅴ concentrator applications sunlight is focused onto the surface of cell with a wide angular distribution that limits the effectiveness of conventional thin-film AR coatings. Furthermore the transmission properties are generally degraded non-uniformly over the electromagnetic spectrum which in the case of multi-junction solar cells leads to additional sub-cell current matching related losses. Here, and in an attempt to identify a better alternative to the conventional dual layer ARCs, we have undertaken a systematic analysis of design parameters and angular dependent antireflective properties of dielectric grating formed through the implementation of sub-wavelength arrays of 2D pyramidal and hemispherical textures. The evaluation indicates that through a careful selection of the design and dielectric material these structures can significantly surpass the performance of planar double layer ARCs (i.e. MgF_2/ZnS), and the total number of reflected photons over the 380-2000 nm wavelength range can be reduced to less than 2%. Finally it is shown that the implementation of these structures for a typical 3 or 4 junction solar cells (i.e. inverted metamorphic) and for acceptance angles ranging from 0-60 degrees, reduces total losses of reflected photons for each subcell (and to some extent the resulting current degradation) to less than 4%. Anti-reflection and angular tolerant properties of 2D TiO_2 surface texturing made by nano imprinting technique were simulated and measured in this work. It has been proved that from both simulation and experimental work textured surface surpasses both antireflection and angular tolerant characters of planar ARC, which supplies a potential candidate AR structure for concentrated photovoltaic system.
机译：在高ⅩⅢ-Ⅴ聚光器应用中，太阳光以宽角度分布聚焦在电池表面，这限制了常规薄膜增透膜的有效性。此外，传输特性通常在电磁频谱上不均匀地劣化，这在多结太阳能电池的情况下导致额外的子电池电流匹配相关损耗。在这里，为了找到更好的替代传统双层ARC的方法，我们对介电光栅的设计参数和与角度相关的抗反射特性进行了系统分析，该介质是通过实现2D金字塔形和半球形纹理的亚波长阵列而形成的。评估表明，通过仔细选择设计和介电材料，这些结构可以大大超过平面双层ARC（即MgF_2 / ZnS）的性能，并且在380-2000 nm波长范围内的反射光子总数可以达到减少到不到2％。最终表明，对于典型的3或4结太阳能电池（即倒置变质）以及0-60度范围内的接受角，这些结构的实现减少了每个子电池的反射光子的总损耗（在一定程度上降低了导致电流下降）小于4％。在这项工作中，模拟和测量了通过纳米压印技术制备的二维TiO_2表面纹理的抗反射和耐角性能。已经证明，从仿真和实验工作来看，纹理表面都超过了平面ARC的抗反射和角度耐受特性，这为聚光光伏系统提供了潜在的候选AR结构。

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