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In-Situ Assessment of Macropore Growth in Low-Doped n-Type Silicon

机译:低掺杂n型硅大孔生长的原位评估

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摘要

Understanding pore growth in semiconductors in detail needs some in-situ information about the processes occurring in a growing pore. It is shown that dual-mode in-situ FFT impedance spectroscopy can provide useful data for macropore etching in n-type Si under back side illumination. A new illumination mode is used alternating with the conventional current-voltage mode, and data evaluation is based on an advanced model developed for this kind of pore etching. The principles of the technique and the basics of the model are introduced and illustrated by a number of examples, some of which show new kinds of pore growth modes.
机译:详细了解半导体中的孔生长需要有关在生长的孔中发生的过程的一些原位信息。结果表明,双模原位FFT阻抗谱可以为背面照明下n型Si中的大孔蚀刻提供有用的数据。一种新的照明模式与传统的电流-电压模式交替使用,并且数据评估基于针对此类孔蚀刻开发的高级模型。介绍了该技术的原理和模型的基础,并通过许多示例进行了说明,其中一些示例显示了新型的孔隙生长模式。

著录项

  • 来源
  • 会议地点 HonoluluHI(US);Volker Lehmann and Vitali Parkhutik(US)
  • 作者单位

    Institute for Materials Science, Christian-Albrechts-University of Kiel, Kaiserstrasse 2, 24143 Kiel, Germany;

    Institute for Materials Science, Christian-Albrechts-University of Kiel, Kaiserstrasse 2, 24143 Kiel, Germany;

    Institute for Materials Science, Christian-Albrechts-University of Kiel, Kaiserstrasse 2, 24143 Kiel, Germany;

    Institute for Materials Science, Christian-Albrechts-University of Kiel, Kaiserstrasse 2, 24143 Kiel, Germany;

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  • 正文语种 eng
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