首页> 外文会议>Porous Semiconductors: A Symposium Held in Memory of Vitali Parkhutik and Volker Lethmann >Formation of Porous Noble Metal Layer by Displacement Reactions with Porous Silicon
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Formation of Porous Noble Metal Layer by Displacement Reactions with Porous Silicon

机译:与多孔硅的置换反应形成多孔贵金属层

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摘要

Porous Pd layer was synthesized on a Si wafer using anodized porous Si as a starting material. In the immersion plating, Pd replaced Si and porous Pd layer was formed. Pt was deposited on the porous Pd layer by galvanic displacement reaction. It was demonstrated that fabrication process of our micro fuel cell electrode was applicable.
机译:使用阳极氧化的多孔硅作为起始原料,在硅晶片上合成了多孔的Pd层。在浸镀中,用Pd代替Si,形成多孔的Pd层。通过电流置换反应将Pt沉积在多孔Pd层上。证明了我们的微型燃料电池电极的制造工艺是适用的。

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