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Positron Lifetime at Deep Donors of Radiation Origin in Proton - Irradiated FZ-Silicon Single Crystals

机译:质子辐照的FZ-硅单晶中深辐射源供体的正电子寿命

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The recovery of shallow donor states of the atoms of phosphorus in n-FZ-Si:P material irradiated at the room temperature with 15 MeV protons was studied in the course of isochronal annealing. This process was investigated by the positron annihilation lifetime (PAL) spectroscopy and by low-temperature electrical measurements. The positron traps of a vacancy type manifesting themselves as deep donors have been revealed. These defects begin to anneal at ~593 K- 613 K; roughly estimated activation energy of the process is E_a ≈ 0.59 eV under the first order of reaction. The results suggest the involvement, at least, of one vacancy and the impurity atom of phosphorus in the microstructure of the deep donor.
机译:在等时退火过程中,研究了室温下用15 MeV质子辐照的n-FZ-Si:P材料中磷原子的浅施主态的回收率。通过正电子an灭寿命(PAL)光谱和低温电学测量研究了该过程。空位类型的正电子陷阱表现为深的供体。这些缺陷在〜593 K- 613 K处开始退火;在第一阶反应下,该过程的活化能大约为E_a≈0.59 eV。结果表明,至少一个空位和磷的杂质原子参与了深施主的微观结构。

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