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Define high quality type-I InGaAsSb/AlGaAsSb QW laser fabrication process with high-resolution x-ray diffraction

机译:定义具有高分辨率x射线衍射的高品质I型InGaAsSb / AlGaAsSb QW激光器制造工艺

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摘要

Active InGaAsSb/AlGaAsSb type-I quantum well (QW) compositions acceptable for pseudomorphic growth on GaSb substrates restrict the optical range to below 4 μm. Increasing the In concentration in active region and growing lattice-matched barrier/cladding layers will reach higher emission wavelength. We need to overcome several issues during fabrication process to ensure this high quality epitaxial layer. In this paper, high-resolution x-ray diffraction (HRXRD) method is used to define optimal epitaxy parameters for stable type-I GaSb-based mid infrared laser structures.
机译:可以在GaSb衬底上进行伪晶生长的有源InGaAsSb / AlGaAsSb I型量子阱(QW)组合物将光学范围限制在4μm以下。有源区中In浓度的增加和晶格匹配的势垒/覆层的生长将达到更高的发射波长。我们需要在制造过程中克服几个问题,以确保这种高质量的外延层。在本文中,高分辨率X射线衍射(HRXRD)方法用于定义稳定的基于I型GaSb的中红外激光结构的最佳外延参数。

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