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首页> 外文会议>Proceedings of the 9th China-Japan Symposium(CJS-9) on Materials for Advanced for Energy Systems and Fission amp; Fusion Engineering Jointed with CAS-JSPS Core-university Program Seminar on Fusion Materials, System and Design Integration >Behavior of hydrogen isotopes interacting with defects in lithium-containing oxides
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Behavior of hydrogen isotopes interacting with defects in lithium-containing oxides

机译：氢同位素与含锂氧化物中的缺陷相互作用的行为

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For LiTaO<,3><001> single crystal, in-situ IR absorption analysis was conducted during 300keV D<'+> irradiation and in-situ IR absorption analysis & TDS were conducted after the ion irradiation. Two O-D peaks at 2615 cm<'-1> (-OD<'-> interacting with Ta defect) and 2575cm<'-1> (-OD<'-> interacting with Li defect or interstitial D<'+>) ware mainly observed. They showed similar fluence dependence, namely increase of peak area almost linear to ion fluence. The -OD<'-> interacting with Ta defect was indicated to have a higher stability than that interacting with Li defect or interstitial D<'+>. The former -OD<'-> was decreased by recovery of Ta defect and was desorbed in hydrogen molecular forms (D<,2> and HD), while the latter -OD<'-> was decreased by diffusion to the surface and following desorption in water forms (D<,2>O and HDO), basically.
机译：对于LiTaO 3，001的单晶，在300keV D'+辐射期间进行原位红外吸收分析，在离子辐照之后进行原位IR吸收分析和TDS。在2615 cm'-1处（-OD <->与Ta缺陷相互作用）和2575cm <-1>处（-OD <->与Li缺陷或间质D'+相互作用）的两个OD峰主要观察到。他们显示出相似的注量依赖性，即几乎与离子注量线性相关的峰面积增加。与Ta缺陷相互作用的-OD-具有比与Li缺陷或间隙D-+相互作用更高的稳定性。前者的-OD-被还原为Ta缺陷，并以氢分子形式（D，2和HD）解吸，而后者的-OD-被扩散至表面并随后被降低基本上以水形式（D 2，O和HDO）解吸。

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