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首页> 外文会议>Proceedings of the Twenty-sixth annual meeting of the American Society for Precision Engineering >Metrology of a Precision Plasmonic Lithography Stage
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Metrology of a Precision Plasmonic Lithography Stage

机译：精密等离子平版印刷台的计量

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摘要

Plasmonic lithography is a promising technology for next generation nanoscale manufacturing providing a solution of semiconductor industry to continue to shrink linewidths to less than 20 nm. To achieve these dimensions it is necessary to integrate all the components into a whole manufacturing system. This system needs to be validated metrologically. In this paper, a thorough metrology scheme is proposed to model, measure, calibrate and correct the systematic errors of the stage's positioning performance. Capacitance gages and interferometers provide the critical assessments are used for geometric errors. Thermal and environmental deviations will be studied separately. A detailed systematic error model based on homogeneous transformation matrices (HTMs) has been derived.
机译：等离子光刻技术是下一代纳米级制造的有前途的技术，为半导体行业提供了一种解决方案，可将线宽继续缩小到20 nm以下。为了实现这些尺寸，必须将所有组件集成到整个制造系统中。该系统需要进行计量验证。本文提出了一种全面的计量方案，以对平台定位性能的系统误差进行建模，测量，校准和校正。电容表和干涉仪提供了用于几何误差的关键评估。热和环境偏差将分别进行研究。已经得出了基于齐次变换矩阵（HTM）的详细的系统误差模型。

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