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首页> 外文会议>Progress in functional materials >Ten-micrometer-thick Silicon Diaphragm Used in Condenser Microphone
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Ten-micrometer-thick Silicon Diaphragm Used in Condenser Microphone

机译：电容麦克风用十微米厚的硅膜片

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摘要

Small condenser microphones with high performances are strongly demanded. This paper describes a silicon condenser microphone fabricated on silicon on insulator (SOI) substrate using only one photo mask with improved sensitivity performance. The improvements were due to reduction of the floating capacitance, thinning of the silicon diaphragm, and increasing the electrode area at the back plate of the microphone. This microphone consists of a diaphragm with the thickness of 10 μm and the diameter of 2 mm, a SiO_2 insulative spacer (4-μm-thick buried oxide), and a 300-μm thick silicon back plate with the meshed structures having small (60 μm) hexagonal shaped acoustic holes. The gap between the 10-μm-thick silicon diaphragm and the back plate was 4 μm. This microphone was confirmed to function in the auditory frequency region with a sensitivity of-85 ～ -70 dB.
机译：强烈要求高性能的小型电容传声器。本文介绍了一种仅使用一个具有改善的灵敏度性能的光掩模在绝缘体上硅（SOI）基板上制造的硅电容麦克风。改进归因于浮动电容的减少，硅膜片的变薄以及麦克风背板上电极面积的增加。该传声器由厚度为10μm，直径为2 mm的膜片，SiO_2绝缘垫片（厚度为4μm的埋入氧化物）和厚度为300μm的硅背板组成，网状结构较小（60 （μm）六角形声孔。厚度为10μm的硅膜片和背板之间的间隙为4μm。确认该麦克风在听觉频率范围内起作用，灵敏度为-85〜-70 dB。

著录项

  • 来源
    《Progress in functional materials》|2012年|277-280|共4页
  • 会议地点 Shanghai(CN)
  • 作者

    Naoki Kimori; Yuichiro Kumai; Shinsuke Hishinuma; Tsuyoshi Ikehara; Ryutaro Maeda; Yasushiro Nishioka;

  • 作者单位

    College of Science and Technology, Nihon University, 7-24-1 Narashinodai, Funabashi-shi, Chiba 274-8501, JAPAN;

    College of Science and Technology, Nihon University, 7-24-1 Narashinodai, Funabashi-shi, Chiba 274-8501, JAPAN;

    College of Science and Technology, Nihon University, 7-24-1 Narashinodai, Funabashi-shi, Chiba 274-8501, JAPAN;

    National Institute of Advanced Industrial Science and Technology (AIST), 1-2-1 Namiki. Tsukuba, Ibaraki 305-8504, JAPAN;

    National Institute of Advanced Industrial Science and Technology (AIST), 1-2-1 Namiki. Tsukuba, Ibaraki 305-8504, JAPAN;

    College of Science and Technology, Nihon University, 7-24-1 Narashinodai, Funabashi-shi, Chiba 274-8501, JAPAN;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    MEMS; Silicon; Microphone; SOI wafer;

    机译：MEMS;硅;麦克风; SOI晶圆;

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