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Antireflection and Scattering Properties of Two-Dimensional Hexagonal AZO Gratings on Glass Substrates

机译:二维六角形AZO光栅在玻璃基板上的抗反射和散射特性

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With photoresist dot arrays fabricated by a two-beam interference lithography as an etch mask, two-dimensional (2-D) hexagonal aluminum-doped zinc oxide (AZO) submicron gratings (SMG) with 160nm height (h) and different periods (P) were produced using lift-off transfer process. Results show that as P decreased to 487nm, SMG exhibited excellent antireflection properties, which reduced the average total reflectivity (R_(total)) from 11.8% of AZO thin film to 4.7% in the wavelength range of 400nm-1050nm, and promoted the total transmittance (T_(total)) significantly, especially in the long spectral range of 750nm-1050nm. On the other hand, as P increased from 487nm to 985nm, the haze parameters of reflecatnce (H_R) or transmittance (H_T) enhanced from 25.5% to 40.2% or from 15.1% to 36.8%, respectively. Nevertheless, P increased from 985nm to 1435nm, both R_(total)/(or T_(total)) and H_R (or H_T) varied very slightly. Bidirectional distribution functions at normal incidence not only verified that the larger the P was, the part of diffuse reflectance (or transmittance) were much higher, but also further demonstrated the larger the P, the smaller the diffaction angle. In summary, 2-D hexagonal AZO SMG showed promising antireflection effects as P less than 487nm, and showed promising scattering abilities at P was about 985nm.
机译:使用通过两束干涉光刻法制成的光致抗蚀剂点阵列作为蚀刻掩模,具有160nm高度(h)和不同周期(P)的二维(2-D)六边形铝掺杂氧化锌(AZO)亚微米光栅(SMG) )是使用剥离转移工艺生产的。结果表明,当P降至487nm时,SMG表现出优异的抗反射性能,在400nm至1050nm波长范围内,平均总反射率(R_(total))从AZO薄膜的11.8%降至4.7%,并提高了总反射率。透射率(T_(total))显着,尤其是在750nm-1050nm的长光谱范围内。另一方面,随着P从487nm增加到985nm,反射率(H_R)或透射率(H_T)的雾度参数分别从25.5%增加到40.2%,或从15.1%增加到36.8%。然而,P从985nm增加到1435nm,R_(total)/(或T_(total))和H_R(或H_T)都变化很小。法向入射时的双向分布函数不仅验证了P值越大,部分漫反射率(或透射率)要高得多,而且还证明了P值越大,衍射角越小。总之,二维六角形AZO SMG在P小于487nm时显示出令人满意的抗反射效果,在P约为985nm时显示出令人满意的散射能力。

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