X-ray interferometric diffraction topography of crystal imperfections

机译：晶体缺陷的X射线干涉衍射形貌

获取原文

获取原文并翻译 | 示例

页面导航

摘要
著录项
相似文献
相关主题

摘要

A method for X-ray interferometric investigation of the deformation field of crystal imperfections by means of double and triple interferometers is proposed. It is shown experimentlly that using double and triple interferometers one can detect segregation lines, displacement lines, as well as the Moire patterns of imperfections of different types.

机译：提出了一种利用双干涉仪和三重干涉仪对晶体缺陷的形变场进行X射线干涉测量的方法。实验表明，使用双干涉仪和三干涉仪可以检测偏析线，位移线以及不同类型缺陷的莫尔条纹。

著录项

来源
《X-Ray FEL Optics and Instrumentation 30-31 July 2000 San Diego, USA》|2000年|p.103-108|共6页
会议地点 San Diego CA(US)
作者
Arsen O.Aboyan; Arpat S.Avanesyan;
展开▼
作者单位

展开▼
会议组织
原文格式 PDF
正文语种 eng
中图分类无线电电子学、电信技术;
关键词
X-ray interferometer; single crystals; silicon crystals; stereometry; Moire patterns; topograms;

机译：X射线干涉仪；单晶;硅晶体立体测量莫尔条纹；地形图;

相似文献

外文文献
中文文献
专利

1. STEREOMETRICAL X-RAY INTERFEROMETRIC DIFFRACTION TOPOGRAPHY OF CRYSTAL IMPERFECTION [J] . Aboyan AO. Crystal Research and Technology: Journal of Experimental and Industrial Crystallography . 1996,第4期

机译：晶体缺陷的立体X射线干涉衍射图
2. Synchrotron white beam X-ray topography, transmission electron microscopy and high-resolution X-ray diffraction studies of defects and strain relaxation processes in wide band gap semiconductor crystals and thin films [J] . Dudley M, Bai J, Huang X, Materials science in semiconductor processing . 2006,第1a3期

机译：同步带隙白光X射线形貌，透射电子显微镜和高分辨率X射线衍射研究宽带隙半导体晶体和薄膜中的缺陷和应变松弛过程
3. Characterization of an Yb:LuVO4 single crystal using X-ray topography, high-resolution X-ray diffraction, and X-ray photoelectron spectroscopy [J] . W. Paszkowicz, P. Romanowski, J. Bak-Misiuk Radiation Physics and Chemistry . 2011,第10期

机译：使用X射线形貌，高分辨率X射线衍射和X射线光电子能谱表征Yb：LuVO4单晶
4. X-ray interferometric diffraction topography of crystal imperfections [C] . Arsen O.Aboyan, Arpat S.Avanesyan, SPIE-The International Society for Optical Engineering X-Ray FEL Optics and Instrumentation . 2000

机译：X射线干涉测量差异晶体缺陷的衍射形貌
5. STRESS INDUCED LATTICE IMPERFECTIONS IN VARIOUS POLYCRYSTALLINE MATERIALSDETERMINED BY X-RAY DIFFRACTION [D] . STITT, WILLIAM RODGER. 1969

机译：X射线衍射测定的各种多晶硅材料中的应力诱导晶格缺陷
6. A 7 µm mini-beam improves diffraction data from small or imperfect crystals of macromolecules [O] . Ruslan Sanishvili, Venugopalan Nagarajan, Derek Yoder, -1

机译：7μm的微型光束可改善大分子小晶体或不完美晶体的衍射数据
7. Studies of Crystal Imperfections in Ice with Reference to the Growth Process by the use of X-Ray Diffraction Topography and Divergent Laue Method [O] . Yukiko Mizuno 1978

机译：通过使用X射线衍射形貌和发散劳关法参考冰晶体缺陷的研究
8. X-Ray Diffraction Microscopy of Imperfections in Semiconductor Crystals [R] . Schwuttke, G. H. 1964

机译：半导体晶体中缺陷的X射线衍射显微镜

X-ray interferometric diffraction topography of crystal imperfections

摘要

著录项

相似文献

相关主题

期刊订阅