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Charging effects in Spatial Light Modulators based on Micromirrors

机译:基于微镜的空间光调制器中的充电效果

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This paper describes charging effects on spatial light modulators (SLM). These light modulators consist of up to one million mirrors that can be addressed individually and are operated at a frame rate of up to 2 kHz. They are used for DUV mask writing where they have to meet very high requirements with respect to accuracy. In order to be usable in a mask-writing tool, the chips have to be able to work under DUV light and maintain their performance with high accuracy over a long time. Charging effects are a problem frequently encountered with MEMS, especially when they are operated in an analog mode. In this paper, the issue of charging effects in SLMs used for microlithography, their causes and methods of their reduction or elimination, by means of addressing methods as well as technological changes, will be discussed. The first method deals with the way charges can accumulate within the actuator, it is a simple method that requires no technological changes but cannot always be implemented. The second involves the removal of the materials within the actuator where charges can accumulate.
机译:本文介绍了对空间光调制器(SLM)的充电效应。这些光调制器由多达一百万个反射镜组成,这些反射镜可以单独寻址,并以高达2 kHz的帧频运行。它们用于DUV掩模书写,在准确性方面必须满足很高的要求。为了能够在掩模写入工具中使用,这些芯片必须能够在DUV光线下工作并长时间保持高精度的性能。充电效应是MEMS经常遇到的问题,尤其是当它们以模拟模式工作时。在本文中,将讨论用于微光刻的SLM中的带电效应问题,其成因以及通过解决方法以及技术变化来减少或消除它们的方法。第一种方法处理电荷在执行器中的累积方式,这是一种简单的方法,不需要技术更改,但不能始终实现。第二个步骤是清除执行机构内可能积聚电荷的材料。

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